|
|
|
Advanced Image Analysis Solutions for Critical Dimensions in Semiconductors and PCBs
|
Resources
|
Layer Alignment and Registration
Multi-layer PCBs require exact alignment of layers. MIPAR's software facilitates:
• Registration Analysis: Measurement of layer alignment to detect misregistration issues.
• Drill Hole Position Verification: Ensures drilled holes align correctly with pads and traces.
Advanced Image Processing Techniques
Deep Learning and Modern AI
Our software utilizes the latest technologies in image analysis to accurately segment features under varying imaging conditions, ensuring reliable measurements across different samples and materials.
Automated Measurement Protocols
• Batch Processing: Analyze large datasets automatically, increasing throughput.
• Customizable Algorithms: Tailor measurement algorithms to specific materials, processes, and feature types.
Integration with Industry Metrology Systems
MIPAR seamlessly integrates with standard metrology equipment and workflows:
• Optical, SEM and AFM Image Analysis: Supports images from Scanning Electron Microscopes (SEM) and Atomic Force Microscopes (AFM) for detailed surface and feature analysis.
• Data Export and Reporting: Generate comprehensive reports and export data in formats compatible with other engineering software.
Impact on Manufacturing and Quality Control
Enhanced Process Control
Accurate critical dimension measurements enable tighter process control, reducing variability and defects in manufacturing processes for semiconductors and PCBs.
Improved Yield and Reliability
By ensuring features are within specified tolerances, manufacturers can improve device performance and reliability, leading to higher customer satisfaction and reduced returns. Cost and Time Efficiency Automated measurement and analysis reduce the need for manual inspections, saving time and labor costs while increasing throughput and efficiency.
Empower Your Critical Dimension Measurements with MIPAR
Integrating MIPAR into your measurement processes provides the accuracy and reliability needed for today's advanced semiconductor and PCB manufacturing. Our specialized focus on critical dimension analysis ensures you have the tools necessary to meet the exacting demands of modern electronics production.
Experience Unmatched Precision Today
Contact us to discover how MIPAR's advanced image analysis solutions can elevate your critical dimension measurements and enhance your manufacturing performance. Contact Us >>
System Requirements
Documentation >>
Demo
Interested in seeing MIPAR's capabilities in electron microscope-based cell analysis? We've made it simple to schedule a demo with one of our Applications Engineers to experience the power of our software.
Support
Connect with our Applications Engineers, who bring extensive experience in life sciences and automated micrograph analysis. Our support team is dedicated to partnering with you in your scientific endeavors, providing expert assistance and insights.
Cost
Licensing costs vary depending on the type of license and the number of users. For detailed pricing information tailored to your electron microscopy cell analysis needs, please submit a quote request, and a representative will respond promptly.
Check Out Our Products
|
MIPAR Base: our core product to analyze images from almost any source. Extensions enable Deep Learning models, Word reports and 3D data analysis. MIPAR Base Page >> |
|
Microscope Software: capture, analyze and report all in a single workflow with MIPAR Live. Check to see if your camera is supported. MIPAR Live Page >> |
|
Compliance Software: analyze, report, and approve in a 21 CFR Part 11 or GMP Annex 11 compliant environment with traceability. MIPAR Checkpoint Page >> |
|
MIPAR APIs: tools to help integrate MIPAR detection and measurement solutions into other software applications and workflows. APIs Page >> |
